Products High Temperature Furnaces MPCVD 915MHz MPCVD Diamond Machine Microwave Plasma Chemical Vapor Deposition System Reactor
915MHz MPCVD Diamond Machine Microwave Plasma Chemical Vapor Deposition System Reactor

MPCVD

915MHz MPCVD Diamond Machine Microwave Plasma Chemical Vapor Deposition System Reactor

Item Number : MP-CVD-101

Price varies based on specs and customizations


Output power
3-75kW continuously adjustable
Sample stage diameter
≥200mm
Operating frequency
915±15MHz
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KINTEK MPCVD Diamond Machine: Revolutionizing Diamond Synthesis

The KINTEK MPCVD Diamond Machine leverages Microwave Plasma Chemical Vapor Deposition (MPCVD) to synthesize high-quality diamonds with unprecedented speed and precision. This advanced technology enables faster crystal growth, increased production capacity, and enhanced diamond quality compared to traditional methods.

Visual Overview & Key Components

MPCVD details

MPCVD details

Unlock Superior Diamond Production with KINTEK

Our MPCVD Diamond Machine offers significant advantages for your diamond synthesis needs:

  • Accelerated Crystal Growth: Achieve growth speeds 10-100 times faster than traditional methods, significantly boosting production efficiency.
  • Increased Production Capacity: Synthesize larger batches of diamonds in a single run, maximizing your output.
  • Exceptional Diamond Quality: Produce diamonds with higher hardness and toughness than natural diamonds, ensuring superior durability and performance.
  • Diverse Color Options: Create diamonds in a variety of colors, including white, yellow, pink, and blue, to meet diverse market demands and aesthetic preferences.
  • Unmatched Purity: Achieve higher purity levels than natural Type II diamonds, resulting in exceptional optical properties and suitability for advanced applications.
  • Tailored to Your Needs: Benefit from multi-style customization. We can adapt designs to meet specific market requirements and unique experimental setups.

The Science Behind the Sparkle: Advanced MPCVD Technology

Microwave Plasma Chemical Vapor Deposition (MPCVD) is a sophisticated process where a continuous microwave source generates and sustains a highly reactive plasma. This plasma is composed of reacting chemicals (typically methane and hydrogen) and essential catalysts, which are then used to cultivate new diamond layers on a diamond-seeded substrate.

The KINTEK MPCVD Diamond Machine allows for precise control over microwave power and reaction temperature, effectively eliminating common issues faced in other CVD methods. By optimizing the reaction chamber design and process parameters, it achieves a stable plasma discharge – a crucial factor for consistently producing high-quality, large-size single-crystal diamonds.

Versatile Applications Across Industries

The unique properties of diamonds produced by our MPCVD machines – including exceptional hardness, stiffness, high thermal conductivity, low thermal expansion, radiation-hardness, and chemical inertness – make them invaluable across various sectors:

  • Gemstone Industry: The primary equipment for growing high-quality, large-size diamond gemstones.
  • Advanced Materials & Semiconductors: Production of diamond films for diverse applications, including large-size diamond substrates for the semiconductor industry and high-performance diamond cutting or drilling tools.
  • Industrial Tools: Development of diamond coatings for cutting tools, drill bits, and other industrial applications where extreme hardness and durability are paramount.
  • Biomedical Sector: Creation of biocompatible and durable diamond coatings for medical implants, such as artificial joints and dental implants.
  • Optoelectronics: Manufacturing of diamond windows and substrates for high-power lasers, detectors, and other optoelectronic devices where high thermal conductivity and low thermal expansion are critical.

Technical Specifications

Microwave system (according to optional power supply)

  • Operating frequency:915±15MHz
  • Output power:3-75kW continuously adjustable
  • Cooling water flow:120/min
  • System standing wave coefficient:VSWR≤1.5
  • Microwave leakage:

Vacuum system and reaction chamber

  • Leakage rate
  • The ultimate pressure is less than 0.7Pa (this machine comes with imported Pirani vacuum gauge)
  • The pressure rise in the cavity shall not exceed 50Pa after 12 hours of maintaining pressure.
  • Reaction chamber working mode: TM021 or TM023 mode
  • Cavity type: cooled cylindrical cavity, can carry power up to 75KW, high purity ,Stone ring seal.
  • Inlet method: Top sprinkler head inlet.
  • Observation temperature measurement window: 8 observation holes, evenly distributed horizontally. 
  • Sampling port: bottom lifting sampling port

Sample holder system

  • Sample stage diameter ≥200mm, single crystal effective use area ≥130mm,The effective use area of polycrystalline is ≥200mm. Substrate platform water-cooled sandwich structure, vertical straight up and down.

Gas system

  • Full metal welded gas plate 5-7 gas lines
  • All internal air circuits of the equipment use welding or VCR connectors.

System cooling

  • 3-way water cooling, real-time monitoring of temperature and flow.
  • System cooling water flow 120L/min, cooling water pressure

Temperature measurement method

  • External infrared thermometer, temperature range 3001400 M

SL901A Equipment Key Part List

serial number Module name Remark
1 Microwave power supply Standard domestic magnetron: Yingjie Electric / Distinguish power supply Domestic solid-state source: Watson (+30,000) Imported magnetron: MKS/ pastoral (+100, 000)
2 Waveguide, three pins, mode converter, upper resonator Self made
3 Vacuum reaction chamber (upper chamber, lower chamber, connectors) Self made
4 Infrared thermometers, optical displacement components, brackets Infrared thermometers, optical displacement components, Fuji Gold Siemens + Schneider brackets
5 Water-cooling table motion components (cylinders, workpieces, etc.)
6 Ceramic thin film vacuum gauge,Pirani vacuum gauge Inficon
7 Vacuum valve components (ultra-high vacuum gate valve, precision pneumatic valve*2, electromagnetic vacuum charging differential valve) Fujikin + Zhongke + Himat
8 Vacuum pump and connecting pipe fittings, tee, KF25 bellows*2, adapter Pump: Flyover 16L
9 Metal microwave sealing ring*2; metal vacuum sealing ring*1; Quartz plate Quartz: Shanghai FeilihuaSemiconductor Grade High Purity Quartz
10 Circulating water components (joints, diverter blocks, flow detectors) Japanese SMC/CKD
11 Pneumatic part (CKD filter, airtac multi-way solenoid valve, pipe fittings and adapters)
12 Gas connector, EP gas pipe, VCR connector, filter 0.0023μm *1, filter 10μm*2 Fujikin
13 Machine casing, stainless steel table, universal wheels, feet, bracket fastening screws, etc custom processing
14 Gas flow meter*6 (including one pressure control) Standard seven-star , optional Fuji Gold ( +34,000 ) / Alicat (42,000)
15 Gas plate processing (5-way gas, filter*5, pneumatic valve*5, manual valve*6, pipeline welding) Fuji Gold
16 PLC automatic control Siemens + Schneider
17 Molybdenum table

Partner with KINTEK for Your Advanced Material Needs

Leveraging exceptional R&D and in-house manufacturing, KINTEK specializes in advanced high-temperature furnace solutions like the MPCVD Diamond Machine. We pride ourselves on our strong deep customization capability, ensuring our systems, including this advanced diamond synthesis equipment, precisely meet your unique experimental and production requirements.

Ready to elevate your diamond synthesis? KINTEK’s MPCVD Diamond Machine offers unparalleled precision and efficiency. Contact us today to discuss your specific requirements and discover how our technology can elevate your operations. Fill out the form below or click here to get started and request a quote or consultation!

FAQ

What Is The Principle Of An MPCVD Machine?

An MPCVD (Microwave Plasma Chemical Vapor Deposition) machine operates by using a microwave generator to produce plasma by ionizing a gas mixture. This plasma is housed in a reaction chamber under low pressure, where the substrate is held in place by a substrate holder. The key components include a Microwave Generator, Plasma Chamber, Gas Delivery System, Substrate Holder, and Vacuum System.

What Are The Advantages Of Using An MPCVD Machine?

MPCVD machines offer several advantages: they eliminate contamination from hot wires (non-polar discharge), allow the use of multiple gases, provide stable control of reaction temperature, enable large-area stable discharge plasma, and offer precise control over film thickness, purity, and crystal quality. Additionally, they produce large-area diamond films, ensure stable conditions, maintain consistent sample quality, and are cost-effective.

What Are The Key Applications Of MPCVD Machines?

MPCVD machines are primarily used for high-purity lab-grown diamond synthesis, including diamond films and other advanced materials. Their applications extend to semiconductor research, optics, and MEMS (Micro-Electro-Mechanical Systems) due to their ability to produce high-quality, homogeneous films with precise control.

What Are The Main Components Of An MPCVD Machine?

The main components of an MPCVD machine include a microwave generator (to produce plasma), a reaction chamber (to house the substrate and gas mixture under low pressure), a substrate holder (to hold the substrate during deposition), a gas delivery system (to introduce and control the gas mixture), and a vacuum system (to maintain the necessary low-pressure environment).

How Does An MPCVD Machine Enhance Energy Efficiency?

An MPCVD machine enhances energy efficiency through its electrode-less process, which reduces contamination and energy loss. The microwave plasma generation is highly efficient, and the system's modular and scalable design allows for optimized energy use across various industrial applications.

Why Is MPCVD Preferred For Diamond Growth?

MPCVD is preferred for diamond growth because it provides a high density of charged particles and reactive species, enables deposition of large-area diamond films at lower pressures, and ensures better homogeneity in the as-grown films. These features result in high-purity, high-quality diamonds with precise control over their properties.
View more faqs for this product

4.8

out of

5

Incredible precision and speed! This machine delivers flawless diamond deposition every time. Worth every penny!

Elara Voss

4.9

out of

5

The quality is unmatched. Our lab's efficiency has skyrocketed since we got this reactor. Highly recommend!

Rafael Mendoza

4.7

out of

5

Fast delivery and easy setup. The technological advancement in this system is mind-blowing. Love it!

Sienna Khatri

4.8

out of

5

Durability is top-notch. This machine handles continuous use without a hitch. A game-changer for our research!

Nikolai Petrov

4.9

out of

5

The value for money is exceptional. The results are consistently high-quality. Couldn't be happier!

Aiko Tanaka

4.7

out of

5

Superb performance! The 915MHz frequency makes all the difference. Our experiments have never been smoother.

Lucien Dubois

4.8

out of

5

This reactor is a beast! The diamond deposition is faster and more efficient than anything we've used before.

Zara Al-Mansoor

4.9

out of

5

The build quality is outstanding. It's clear this was designed with cutting-edge technology. Impressive!

Mateo Silva

4.7

out of

5

Reliable and efficient. This machine has exceeded all our expectations. A must-have for any serious lab.

Anya Kovalenko

4.8

out of

5

The speed of delivery was impressive. The machine works flawlessly right out of the box. Perfect!

Kai Zhang

4.9

out of

5

This reactor is a dream come true. The diamond quality is pristine, and the process is so streamlined. Love it!

Isabella Moretti

4.7

out of

5

Top-tier technology at an affordable price. This machine has revolutionized our workflow. Absolutely stellar!

Javier Rios

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915MHz MPCVD Diamond Machine Microwave Plasma Chemical Vapor Deposition System Reactor

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