MPCVD

Cylindrical Resonator MPCVD Machine System for Lab Diamond Growth

Name: Cylindrical Resonator MPCVD Machine System for Lab Diamond Growth
Brand: Kintek Furnace
SKU: KTWB315
Rating: 4.8 (15 reviews)

Item Number : KTWB315

Price varies based on specs and customizations

Microwave output power: 1～10 KW continuously adjustable
Substrate growing area: 3 inches
Maximum batch load: 45 pieces of diamonds

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Leveraging exceptional R&D and in-house manufacturing, KINTEK provides diverse laboratories with advanced high-temperature furnace solutions, including our cutting-edge MPCVD Systems. Our product line, encompassing Muffle, Tube, Rotary Furnaces, Vacuum & Atmosphere Furnaces, and various CVD/PECVD/MPCVD Systems, is complemented by our strong deep customization capability to precisely meet your unique experimental requirements.

KINTEK MPCVD Systems: Grow High-Quality Diamond Films with Precision

KinTek MPCVD System

Our Microwave Plasma Chemical Vapor Deposition (MPCVD) systems are engineered for laboratories and industries aiming to grow superior quality diamond films. By utilizing a carbon-containing gas and a microwave plasma, KINTEK's MPCVD technology offers a reliable and efficient method for diamond synthesis.

Why Choose KINTEK's MPCVD System?

With years of deep industry involvement and a vast customer base, KINTEK's MPCVD equipment is trusted for its performance and reliability. Our systems have demonstrated:

Exceptional Stability & Reliability: Proven with over 40,000 hours of steady operation.
Repeatability & Cost-Effectiveness: Consistently deliver high-quality results efficiently.
High Capacity: 3 inches substrate growing area, with a maximum batch load of up to 45 pieces of diamonds.
Energy Efficient: 1-10KW adjustable output microwave power for reduced electricity consumption.
Expert Support: Backed by a richly experienced research team offering frontier diamond growing recipe support.
Beginner-Friendly: Exclusive technical support program for teams with zero diamond growing experience.

By leveraging our accumulated advanced technology, we have implemented multiple rounds of upgrades and improvements to our MPCVD system, resulting in significantly improved efficiency and reduced equipment costs. As a result, our MPCVD equipment is at the forefront of technological advancements and offered at a competitive price. Ready to advance your diamond growth capabilities? Consult with our experts today!

Visual Showcase: Results with KINTEK MPCVD

KINTEK MPCVD machines — KINTEK MPCVD diamond machines

In KinTek MPCVD Machine, diamonds are growing

Rough diamond grown by KINTEK MPCVD machine

Key Features & System Components

Our MPCVD systems are designed with precision components for optimal performance during the deposition process. The system typically consists of a vacuum chamber, a microwave generator (often a magnetron or klystron operating around 2.45 GHz coupled via a quartz window), a precise gas delivery system with mass flow controllers (MFCs), and temperature control mechanisms.

Microwave system

Reaction chamber

Gas flow system

Vacuum and sensor system

Technical Specifications

Microwave system	Microwave frequency 2450±15MHZ, Output power 1～10 KW continuously adjustable Microwave output power stability: Microwave leakage ≤2MW/cm2 Output wave guide interface: WR340, 430 with FD-340, 430 standard flange Cooling water flow: 6-12L/min System standing wave coefficient: VSWR ≤ 1.5 Microwave manual 3 pin adjuster, excitation cavity, high-power load Input power supply: 380VAC/50Hz ± 10%, three-phase
Reaction chamber	Vacuum leakage rate The limit pressure is less than 0.7 Pa(Standard setup with Pirani vacuum gauge) The pressure rise of chamber shall not exceed 50Pa after 12 hours of pressure maintaining Working mode of reaction chamber: TM021 or TM023 mode Cavity type: Cylindrical resonant cavity, with maximum bearing power of 10KW, made of 304 stainless steel, with water-cooled inter-layer, and high purity quartz plate sealing method. Air intake mode: Top annular uniform air intake Vacuum sealing: The bottom connection of the main chamber and the injection door are sealed with rubber rings, the vacuum pump and bellows are sealed with KF, the quartz plate is sealed with a metal C-ring, and the rest are sealed with CF Observation and temperature measurement window: 8 observation port Sample load port in front of chamber Stable discharge within the pressure range of 0.7KPa~30KPa (the power pressure shall be matched)
Sample holder	Diameter of sample table≥72mm, effective use area≥66 mm Base plate platform water-cooled sandwich structure Sample holder can be lifted and lowered evenly electrically in the cavity
Gas flow system	All metal welding air disk Welding or VCR joints shall be used for all internal gas circuits of the equipment. 5 channels MFC flow meter, H2/CH4/O2/N/Ar. H2: 1000 sccm ;CH4:100 sccm; O2: 2 sccm; N2: 2 sccm; Ar: 10 sccm Working press 0.05-0.3MPa, accuracy ±2% Independent Pneumatic valve control for each channel flow meter
Cooling system	3 lines water cooling, real-time monitoring of temperature and flow. The system cooling water flow is ≤ 50L/min The cooling water pressure is
Temperature sensor	The external infrared thermometer has a temperature range of 300-1400 ℃ Temperature control accuracy
Control system	Siemens smart 200 PLC and touch screen control are adopted. The system has a variety of programs, which can realize the automatic balance of growth temperature, accurate control of growth air pressure, automatic temperature rise, automatic temperature drop and other functions. The stable operation of the equipment and comprehensive protection of the equipment can be achieved through the monitoring of water flow, temperature, pressure and other parameters, and the reliability and safety of the operation can be guaranteed through functional interlocking.
Optional function	Center monitoring system Substrate basing power

The KINTEK MPCVD Advantage: Superior Diamond Synthesis

KINTEK's MPCVD technology offers significant advantages for diamond synthesis compared to other methods like HFCVD (Hot Filament CVD) and DC-PJ CVD (Direct Current Plasma Jet CVD):

High Purity Diamonds: MPCVD avoids diamond contamination from elements like hot wires (as in HFCVD). In our system, the plasma ball doesn't contact the cavity wall, ensuring an impurity-free growth process and leading to diamonds of higher purity compared to those from the HPHT (High-Pressure High-Temperature) method.
Versatile Gas Use: Allows the use of multiple gases (e.g., CH4, H2, Ar, O2, N2) to meet diverse industrial needs and tailor diamond properties.
Stable & Precise Control: Enables smooth, continuous adjustment of microwave power and stable control of reaction temperature. This avoids issues like crystal seeds falling off the substrate due to arcing and flame failure sometimes seen in DC-PJ CVD. The substrate temperature is precisely controlled by the plasma position and measured by a thermocouple.
Large Area Stable Plasma: The MPCVD method generates a large area of stable discharge plasma, making it the most promising diamond synthesis method for industrial applications and scaling up production.
Energy Efficient & Cost-Effective for Larger Diamonds: The MPCVD production process typically consumes less energy than HPHT and facilitates the production of larger, high-quality diamonds at a potentially lower cost.

Looking for a reliable and advanced diamond synthesis solution that delivers purity and performance? Request a quote for our MPCVD system!

Working Principle: How KINTEK MPCVD Grows Diamonds

The KINTEK MPCVD machine meticulously controls the growth environment. The process begins by controlling the flow of each gas path (reactant gases such as CH4, H2, Ar, O2, N2, etc.) and cavity pressure, introducing these gases into the cavity under specific, stabilized conditions. Once airflow is stable, the 6KW (or adjustable 1-10KW) solid-state microwave generator generates microwaves, which are then introduced into the cavity through a waveguide.

Under the microwave field, the reaction gas transforms into a plasma state, forming a plasma ball that hovers above the diamond substrate. The high temperature of the plasma heats the substrate to the specific temperature required for diamond growth. Excess heat produced in the cavity is efficiently dissipated by the water cooling unit.

To ensure optimal growth conditions during the MPCVD single crystal diamond growth process, factors such as microwave power, gas source composition, and cavity pressure are precisely adjusted. The non-contact nature of the plasma ball with the cavity wall is crucial, as it prevents impurities from contaminating the diamond growth process, thereby enhancing the final quality of the diamond.

Applications of Diamonds Grown with KINTEK MPCVD

Diamond's unique properties—including its extreme hardness, stiffness, high thermal conductivity, low thermal expansion, radiation-hardness, and chemical inertness—make it a highly valuable material. While natural and HPHT diamonds have faced limitations due to cost, size, and impurity control, KINTEK's MPCVD technology opens doors for broader applications:

Gemstone Quality Diamonds: MPCVD is a primary equipment used for growing diamond gemstones, offering a promising route to producing low-cost, high-quality large diamonds for the expanding jewelry market.
Semiconductor Industry: Diamond film growth can be either monocrystal or polycrystalline. It is extensively used for large-size diamond substrates in the semiconductor industry.
Cutting & Drilling Tools: The exceptional hardness of MPCVD diamonds makes them ideal for the diamond cutting or drilling tools industry.
Optics and Advanced Materials: For applications leveraging diamond's unique optical and thermal properties.

Compared to the HPHT method for lab-grown diamonds, the microwave CVD method, as employed by KINTEK, is advantageous for large-sized diamond growth at a lower cost. This makes it an ideal solution for applications in semiconductor diamonds, optics diamond growth, and meeting the needs of the large jewelry diamond market.

Partner with KINTEK for Customized High-Temperature Solutions

Beyond our specialized MPCVD systems, KINTEK offers a diverse product line including Muffle Furnaces, Tube Furnaces, Rotary Furnaces, other Vacuum & Atmosphere Furnaces, and various CVD/PECVD Systems. Our core strength lies in our exceptional R&D, dedicated in-house manufacturing, and profound deep customization capabilities, allowing us to tailor solutions precisely to your specific experimental or production requirements.

Do you have unique requirements or a challenging project? We specialize in developing custom solutions. Contact KINTEK today to discuss your needs and explore how our advanced furnace technology can benefit your work!

FAQ

What Is The Principle Of A CVD Machine?

The principle of Chemical Vapor Deposition (CVD) involves introducing the vapor of gaseous or liquid reactants containing film elements and other necessary gases into a reaction chamber. By applying energy in the form of increased temperature, plasma action, light radiation, or other means, chemical reactions occur on the substrate surface, generating new solid substances that deposit as thin films. The working principle of a CVD furnace involves introducing precursor gases into the furnace chamber, where high temperatures cause these gases to react or decompose near the substrate surface. The desired material deposits on the substrate as a solid film, while by-products and unused gases are evacuated through an exhaust or vacuum system.

What Is The Principle Of An MPCVD Machine?

An MPCVD (Microwave Plasma Chemical Vapor Deposition) machine operates by using a microwave generator to produce plasma by ionizing a gas mixture. This plasma is housed in a reaction chamber under low pressure, where the substrate is held in place by a substrate holder. The key components include a Microwave Generator, Plasma Chamber, Gas Delivery System, Substrate Holder, and Vacuum System.

What Is A PECVD Machine Used For?

A PECVD (Plasma Enhanced Chemical Vapor Deposition) machine is extensively used in silicon and similar material processing, nanotechnology, solar cell production, and electronics. It is crucial for depositing thin films in solar cells and creating high-quality components for electronic devices. Applications include electronic device fabrication (isolation of conductive layers, capacitors, surface passivation), semiconductor devices, printable electronics, and medical device protection.

What Are The Advantages Of Using A CVD Machine?

CVD provides high purity, uniformity, and conformality, making it suitable for coating complex geometries. It is used in industries like semiconductor, aerospace, and biomedical. Unlike PVD, CVD is not limited to line-of-sight application, and the coating bonds to the surface during the reaction, creating superior adhesion.

What Are The Advantages Of Using An MPCVD Machine?

MPCVD machines offer several advantages: they eliminate contamination from hot wires (non-polar discharge), allow the use of multiple gases, provide stable control of reaction temperature, enable large-area stable discharge plasma, and offer precise control over film thickness, purity, and crystal quality. Additionally, they produce large-area diamond films, ensure stable conditions, maintain consistent sample quality, and are cost-effective.

What Are The Main Types Of PECVD Machines?

PECVD machines come in various types, including Inclined Rotary Plasma Enhanced Chemical Deposition PECVD Tube Furnace Machines, Split Chamber CVD Tube Furnaces with Vacuum Stations, RF PECVD Systems, and Cylindrical Resonator MPCVD Machine Systems. Each type is designed for specific applications such as semiconductor research, thin-film deposition, and lab diamond growth.

What Are The Applications Of A CVD Machine?

CVD is used in various applications, including semiconductor device production (e.g., silicon nitride insulating layers), optical coatings, protective coatings, and advanced materials like graphene and carbon nanotubes, which have unique electrical, thermal, and mechanical properties. It is also used to deposit conformal films and modify substrate surfaces in ways traditional techniques cannot. Applications include atomic layer deposition, integrated circuits, photovoltaic devices, wear-resistant coatings, polymer coatings with special properties, metal-organic frameworks for gas sensing, and membrane coatings for water treatment.

What Are The Key Applications Of MPCVD Machines?

MPCVD machines are primarily used for high-purity lab-grown diamond synthesis, including diamond films and other advanced materials. Their applications extend to semiconductor research, optics, and MEMS (Micro-Electro-Mechanical Systems) due to their ability to produce high-quality, homogeneous films with precise control.

How Does A PECVD Machine Work?

A PECVD machine works by using plasma to enhance the chemical vapor deposition process. Deposition rates and film properties (e.g., thickness, hardness, refractive index) are controlled by adjusting parameters such as gas flow rates, operating temperatures, and plasma conditions. The plasma allows for fine-tuning of material properties like density, purity, and roughness, enabling the creation of high-quality thin films at lower substrate temperatures.

What Are The Key Features Of A CVD Machine?

Key features of a CVD furnace include high temperature capability (typically ranging from 200°C to over 1500°C), precise gas flow control, atmosphere control (vacuum, atmospheric pressure, or low-pressure environments), uniform heating for even thin-film deposition, and an efficient exhaust system to remove by-products and unreacted gases. Key characteristics of a CVD coating process include application at elevated temperatures to facilitate the reaction, typically under vacuum. Contaminants must be removed from the part surface before coating.

What Are The Main Components Of An MPCVD Machine?

The main components of an MPCVD machine include a microwave generator (to produce plasma), a reaction chamber (to house the substrate and gas mixture under low pressure), a substrate holder (to hold the substrate during deposition), a gas delivery system (to introduce and control the gas mixture), and a vacuum system (to maintain the necessary low-pressure environment).

What Are The Key Features Of A PECVD Machine?

Key features of a PECVD machine include a universal base console housing electronic subsystems, a PECVD process chamber with a pumping port, heated upper and lower electrodes, parameter ramping software, and a gas pod with mass-flow-controlled gas lines. The system typically includes a chamber, vacuum pump(s), and a gas distribution system, with configurations varying based on power source, gas type, and pressure sensors.

What Types Of CVD Machines Are Available?

There are several types of CVD machines available, including Cylindrical Resonator MPCVD Machine Systems for lab diamond growth, Custom Made Versatile CVD Tube Furnaces for chemical vapor deposition, Slide PECVD Tube Furnaces with liquid gasifiers, Vacuum Hot Press Furnace Machines, Inclined Rotary Plasma Enhanced Chemical Deposition (PECVD) Tube Furnaces, Split Chamber CVD Tube Furnaces with Vacuum Stations, and RF PECVD Systems for radio frequency plasma enhanced chemical vapor deposition. Each type is designed for specific applications and offers unique features.

How Does An MPCVD Machine Enhance Energy Efficiency?

An MPCVD machine enhances energy efficiency through its electrode-less process, which reduces contamination and energy loss. The microwave plasma generation is highly efficient, and the system's modular and scalable design allows for optimized energy use across various industrial applications.

What Are The Advantages Of Using A PECVD Machine?

PECVD machines offer several advantages, including rapid deposition rates (e.g., 160 times faster for silicon nitride compared to CVD), the ability to create films with different properties by adjusting plasma parameters and gas composition, high-quality and uniform thickness films, good adhesion, reduced risk of cracking, and suitability for complex surfaces. They also provide high solvent and corrosion resistance with chemical and thermal stability.

Why Is MPCVD Preferred For Diamond Growth?

MPCVD is preferred for diamond growth because it provides a high density of charged particles and reactive species, enables deposition of large-area diamond films at lower pressures, and ensures better homogeneity in the as-grown films. These features result in high-purity, high-quality diamonds with precise control over their properties.

What Materials Can Be Deposited Using A PECVD Machine?

PECVD machines can deposit a variety of materials, including silicon nitride (SiN) and silicon carbide (SiC), which are particularly useful in semiconductor and high-temperature MEMS applications. These machines are versatile and can be used to create thin films with tailored properties for specific industrial and research needs.

Why Is PECVD Preferred Over Other Deposition Methods?

PECVD is preferred over other deposition methods because it allows for deposition at lower substrate temperatures, provides good step coverage, and enables highly uniform film deposition. It also offers excellent control over material properties such as refractive index, stress, and hardness, making it ideal for applications requiring precise thin-film characteristics.

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4.9

out of

5

This machine is a game-changer! The diamond growth speed is phenomenal, and the quality is unmatched.

Elara Voss

4.8

out of

5

Incredible value for money. The precision and durability of this system are top-notch.

Rohan Mehta

4.7

out of

5

Fast delivery and easy setup. The technological advancement in this machine is mind-blowing.

Sienna Khalid

4.9

out of

5

The consistency in diamond quality is impressive. Worth every penny!

Lucian Berg

4.8

out of

5

Highly efficient and reliable. Perfect for lab diamond growth with minimal maintenance.

Ananya Rao

4.7

out of

5

The cylindrical resonator design is brilliant. Delivers flawless diamonds every time.

Dante Moretti

4.9

out of

5

Exceptional performance! The machine’s durability and advanced tech make it a must-have.

Zara Al-Farsi

4.8

out of

5

Superb investment. The speed and quality of diamond growth exceed expectations.

Kai Zhang

4.7

out of

5

Love the precision! This machine has revolutionized our lab’s diamond production.

Freya Olsen

4.9

out of

5

Outstanding build quality. The diamonds produced are of impeccable clarity and size.

Rafael Costa

4.8

out of

5

Fast, efficient, and reliable. The best MPCVD system we’ve used so far.

Mei Ling

4.7

out of

5

The technology behind this machine is cutting-edge. Highly recommend for any lab.

Elias Van Dijk

4.9

out of

5

Perfect for high-volume diamond growth. The quality is consistently excellent.

Aisha Nkosi

4.8

out of

5

A stellar purchase! The machine’s performance and durability are unmatched.

Mateo Silva

4.7

out of

5

Incredibly advanced and user-friendly. Delivers perfect diamonds with ease.

Yuki Tanaka

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Cylindrical Resonator MPCVD Machine System for Lab Diamond Growth

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Cylindrical Resonator MPCVD Machine System for Lab Diamond Growth

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KINTEK MPCVD Systems: Grow High-Quality Diamond Films with Precision

Why Choose KINTEK's MPCVD System?

Visual Showcase: Results with KINTEK MPCVD

Key Features & System Components

Technical Specifications

The KINTEK MPCVD Advantage: Superior Diamond Synthesis

Working Principle: How KINTEK MPCVD Grows Diamonds

Applications of Diamonds Grown with KINTEK MPCVD

Partner with KINTEK for Customized High-Temperature Solutions

FAQ

What Is The Principle Of A CVD Machine?

What Is The Principle Of An MPCVD Machine?

What Is A PECVD Machine Used For?

What Are The Advantages Of Using A CVD Machine?

What Are The Advantages Of Using An MPCVD Machine?

What Are The Main Types Of PECVD Machines?

What Are The Applications Of A CVD Machine?

What Are The Key Applications Of MPCVD Machines?

How Does A PECVD Machine Work?

What Are The Key Features Of A CVD Machine?

What Are The Main Components Of An MPCVD Machine?

What Are The Key Features Of A PECVD Machine?

What Types Of CVD Machines Are Available?

How Does An MPCVD Machine Enhance Energy Efficiency?

What Are The Advantages Of Using A PECVD Machine?

Why Is MPCVD Preferred For Diamond Growth?

What Materials Can Be Deposited Using A PECVD Machine?

Why Is PECVD Preferred Over Other Deposition Methods?

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